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Strontium Titanate Sputtering Targets and Applications

Strontium Titanate is an oxide of strontium and titanium with the chemical formula SrTiO3. At room temperature, it is a centrosymmetric paraelectric material with a perovskite structure.
Strontium Titanate (SrTiO3) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.9%) is an incipient ferroelectric material with physical and electrical properties that make it a promising candidate for a broad range of technology applications, notably those that require frequency- and phase-agile electronic components such as varactors, voltage-controlled oscillators, and phased-array antennas. For device applications, strontium titanate thin films are particularly attractive due to their high dielectric constant, low loss tangent or dissipation factor in the radio frequency (RF) range, and because they exhibit a tunability of their dielectric constant across a broad operational frequency range.
RF sputtering is highly favored thin film deposition method for strontium titanate sputtering targets. Sputter deposition relies on large electric field potentials to strike target surfaces with ionized gas atoms, either inert or reactive. Impinging gas atoms with high kinetic energy release particles from the target surface into the vapor phase, which then rain down on a substrate material to generate a thin film. This technique is desirable for its high throughput thanks to its potential for large area deposition. Sputter systems range from small laboratory setups to industrial production models that handle batches of wafers simultaneously. Sputtering has shown potential to produce very-high-quality thin films with superb microstructural and electrical properties. Sputtering is one the most used methods to obtain strontium titanate thin films. 
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