Skip to main content

Indium Zinc Oxide Sputtering Targets and Applications



Indium zinc oxide is a chemical compound which consist of indium and zinc metals and oxygen.Indium Zinc Oxide, IZO (InZnO) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.99%) can be used in various applications by obtaining a film. Let's see the applications of indium zinc oxide.
Transparent conducting oxide thin films such as indium tin oxide (ITO), zinc oxide (ZnO), and tin oxide (SnO2) are extensively used as transparent electrodes for touch panels displays, thin films solar cells and flat panel displays. Especially, indium tin oxide thin films have been generally used but these thin films should be heat-treated over 300 oC to have the high transmittance and low resistivity. In addition, high temperature annealing of indium tin oxide films limits the devices to be fabricated on plastic substrate. Recently, it has been reported that new transparent conducting oxide thin film such as indium zinc oxide (IZO) can have high transmittance and low resistivity without heat treatment at high temperature. Because of these properties, the indium zinc oxide thin film is a prospective electrode which can be applied to flexible display devices and solar cells as well as the conventional devices needing transparent conducting oxide films. 
Indium zinc oxide sputtering targets can also be deposited on polyethersulfone (PES) and glass substrates for OLED applications. After deposition of indium zinc oxide sputtering targets for OLED applications, OLEDs show superior current density and luminance characteristics. 

Comments

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...

Improving Dialysis Process with Graphene

Researchers from Mechanical and Electrical Engineering Departments of MIT recently showed that graphene is a powerful material candidate for use in the dialysis systems (such as hemodialysis machines in medical institutes for filtering human blood). In order to prepare graphene as a dialysis material, researchers used a procedure opposite to the general treatments that nanotechnology people use. Dialysis is a process of filtering different solutions such as human blood by a membrane in order to remove waste molecules, drugs, chemical residues from the solution. In some cases, the process can be used for purification of chemicals or isolation of different molecules for medical diagnosis. It is an essential process for scientists especially in the medical operations. Image Retrieved From: http://www.graphene-nownano.manchester.ac.uk/our-research/examples-of-current-projects/fundamental-science/use-of-graphene-as-bio-membrane/ The traditional membranes used in dialysis are thick ...

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...