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Nickel Oxide Sputtering Targets and Applications

Nickel oxide is the chemical compound with the formula NiO. The mineralogical form of NiO, bunsenite, is very rare. It is classified as a basic metal oxide.
Interest in nickel oxide thin films is growing fast due to their importance in science and technology. Nickel Oxide (NiO) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.9%) is a semitransparent p-type semiconducting material with band gap width. Nickel oxide shows attractive electric, electrochromic and thermoelectric properties as well as high chemical resistance. Nickel oxide is an attractive material for use as antiferromagnetic layers, p-type transparent conducting films, in electrochromic devices and as a functional sensor layer for chemical sensors. Nickel oxide sputtering targets can be used as gas sensors or developed to fabricate photodetectors. Lately there has been a lot of interest in nickel oxide’s optical and electrochromic properties connected with its possible application in displays and “smart windows”.
In the bulk, nickel oxide has a cubic structure and thin films of nickel oxide have been fabricated by various physical and chemical vapor deposition techniques such as reactive sputtering and plasma-enhanced chemical vapor deposition. The obtained layers showed chemical stability as well as excellent optical and electrical properties. It is well known that the structural properties, composition and surface morphology of materials in thin film form depend on the used deposition techniques, deposition conditions and post-deposition processing. 
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