Skip to main content

Nickel Oxide Sputtering Targets and Applications

Nickel oxide is the chemical compound with the formula NiO. The mineralogical form of NiO, bunsenite, is very rare. It is classified as a basic metal oxide.
Interest in nickel oxide thin films is growing fast due to their importance in science and technology. Nickel Oxide (NiO) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.9%) is a semitransparent p-type semiconducting material with band gap width. Nickel oxide shows attractive electric, electrochromic and thermoelectric properties as well as high chemical resistance. Nickel oxide is an attractive material for use as antiferromagnetic layers, p-type transparent conducting films, in electrochromic devices and as a functional sensor layer for chemical sensors. Nickel oxide sputtering targets can be used as gas sensors or developed to fabricate photodetectors. Lately there has been a lot of interest in nickel oxide’s optical and electrochromic properties connected with its possible application in displays and “smart windows”.
In the bulk, nickel oxide has a cubic structure and thin films of nickel oxide have been fabricated by various physical and chemical vapor deposition techniques such as reactive sputtering and plasma-enhanced chemical vapor deposition. The obtained layers showed chemical stability as well as excellent optical and electrical properties. It is well known that the structural properties, composition and surface morphology of materials in thin film form depend on the used deposition techniques, deposition conditions and post-deposition processing. 
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Improving Dialysis Process with Graphene

Researchers from Mechanical and Electrical Engineering Departments of MIT recently showed that graphene is a powerful material candidate for use in the dialysis systems (such as hemodialysis machines in medical institutes for filtering human blood). In order to prepare graphene as a dialysis material, researchers used a procedure opposite to the general treatments that nanotechnology people use. Dialysis is a process of filtering different solutions such as human blood by a membrane in order to remove waste molecules, drugs, chemical residues from the solution. In some cases, the process can be used for purification of chemicals or isolation of different molecules for medical diagnosis. It is an essential process for scientists especially in the medical operations. Image Retrieved From: http://www.graphene-nownano.manchester.ac.uk/our-research/examples-of-current-projects/fundamental-science/use-of-graphene-as-bio-membrane/ The traditional membranes used in dialysis are thick ...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more