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Titanium Nitride Sputtering Targets and Applications

Titanium nitride which has the chemical formula of TiN is an extremely hard ceramic material, often used as a coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.
Applied as a thin coating, Titanium Nitride (TiN) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.5%) is used to harden and protect cutting and sliding surfaces, for decorative purposes (due to its golden appearance), and as a non-toxic exterior for medical implants. In most applications a coating of less than 5 micrometres (0.00020 in) is applied.
The titanium thin film coatings are used in many industrial and medical applications owing to its superior properties such as high corrosion resistance, increase in mechanical properties, high thermal properties . Titanium nitride composition has various distinctive advantages such as wear resistant coatings, tools used for cutting, diffusion barriers and integrated circuits. Titanium nitride composition also have outstanding physical properties such as high hardness, inert, high corrosion resistance, low electrical resistivity, excellent thermal stability. These titanium and titanium nitride coating materials have the combination of toughness, inertness, adhesion and hardness, owing to its excellent reflective nature and also used in jewelry and optics. So, titanium and titanium nitride coatings have various advantages over other coating material and the applications ranges from microelectronics, light detectors, cutting tools and medical instrumentation. Therefore, special interest has been developed over the years about these Ti and TiN coatings.
When we look at the sputtering targets we can say that titanium nitride is one of the important compounds prepared by sputtering deposition and these nitride films are used in wide range of applications. The titanium nitride deposition is prepared by using nitrogen as the reactive gas and argon as sputtering gas, the composition of thin films can be controlled by different sputtering gas ratios (Ar/ N2) used.
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