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Magnesium Fluoride Sputtering Targets and Applications

Magnesium Fluoride (MgF2) Sputtering Targets (Size:1'' ,Thickness:0.250'' , Purity: 99.9%), is an inorganic compound with the formula MgF2. The compound is a white crystalline salt and is transparent over a wide range of wavelengths, with commercial uses in optics that are also used in space telescopes. It occurs naturally as the rare mineral sellaite.
Magnesium Fluoride (MgF2) Sputtering Targets can be used in many various applications. Magnesium Fluoride sputtering targets can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
We will give you an example which shows how Magnesium Fluoride (MgF2) Sputtering Targets can be used for anti-reflective coating on glass substrate. An anti-reflection nano coating (AR coating) is a dielectric thin-film coating applied to an optical surface in order to reduce the optical reflectivity of that surface in a certain wavelength range. Ideally, an antireflection coating should have a refractive index equal to the square root of the index of the glass substrate. The most common material for a single-layer coating is magnesium fluoride, which has a relatively low index of about 1.38 at visible wavelengths. Magnesium fluoride is a dielectric material with a wide transmission range and a low refractive index. So it can be used as anti-reflective nano coating to reduce the loss of light in lenses or mirrors. There are various methods of preparing AR nano coating on glass substrates. One of the processes that an be used for this application is ion-beam sputtering method.
Ion-beam sputtering (IBS) is a method in which the target is external to the ion source. A source can work without any magnetic field like in a hot filament ionization gauge. Magnesium fluoride is a key compound which can be used in ion beam sputtering applications. 
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