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Iron Oxide Sputtering Targets and Applications

Iron oxide is a chemical compound with chemical formula of Fe3O4. Iron Oxide (Fe3o4) Sputtering Targets (Size:1'',Thickness:0.125'' , Purity: 99.9%) occurs in nature as the mineral magnetite. Iron oxides are interesting due to their catalytic, magnetic, and semiconducting properties, and because they are produced during corrosion. Their applications include, for example, usage as pigments, catalysts in styrene synthesis, and as a material for high-density magnetic storage.
Thin films of iron oxide sputtering targets can be obtained by different deposition methods and used for various purposes.
Due to the predicted half-metallic nature and high polarization, iron oxide thin films have drawn a great deal of interest as promising candidates for application in tunneling magnetoresistance (TMR) devices. Single crystalline thin films have been epitaxially grown on MgO substrates, due to the good lattice match between the oxides. Polycrystalline iron oxide thin films have also been deposited on Si substrates to study the properties. The deposition methods used to date include plasma assisted molecular-beam epitaxy (MBE), pulsed laser deposition (PLD) from oxide targets, and reactive sputter deposition from an Fe target with Ar–O2 mixture gas flow. 
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