Skip to main content

Molybdenum Disulfide Sputtering Targets and Applications

Molybdenum disulfide is an inorganic compound composed of molybdenum and sulfur. Its chemical formula is MoS2.
The compound is classified as a transition metal dichalcogenide. It is a silvery black solid that occurs as the mineral molybdenite, the principal one for molybdenum. MoS2 is relatively unreactive. It is unaffected by dilute acids and oxygen. In appearance and feel, Molybdenum Disulfide (MoS2) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.9%) is similar to graphite. It is widely used as a dry lubricant because of its low friction and robustness.
Molybdenum disulfide is made up of a single layer of a hexagonal crystal system or multiple layers connected by weak Van der Waals forces. Single-layered molybdenum disulfide consists of three atomic shells: a molybdenum (Mo) atomic shell in the middle and sulfur (S) atomic shells on both the top and bottom. There are very strong covalent bonds between the Mo atoms and S atoms that form the 2D atomic crystals. Natural molybdenum disulfide sputtering target is usually the hexagonal phase, which has semiconducting properties.
Now let's take a look at the applications of molybdenum disulfide sputtering targets. Molybdenum disulfide films obtained by sputtering methods can be used as solid lubricants for rotating and sliding components. Molybdenum disulfide is used as a solid lubricant not only in conventional lubrication situations but also in high temperature and high vacuum environments. Molybdenum disulfide can be sputtered on various surfaces like sapphire for the purpose of rapid thermal annealing. 
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Improving Dialysis Process with Graphene

Researchers from Mechanical and Electrical Engineering Departments of MIT recently showed that graphene is a powerful material candidate for use in the dialysis systems (such as hemodialysis machines in medical institutes for filtering human blood). In order to prepare graphene as a dialysis material, researchers used a procedure opposite to the general treatments that nanotechnology people use. Dialysis is a process of filtering different solutions such as human blood by a membrane in order to remove waste molecules, drugs, chemical residues from the solution. In some cases, the process can be used for purification of chemicals or isolation of different molecules for medical diagnosis. It is an essential process for scientists especially in the medical operations. Image Retrieved From: http://www.graphene-nownano.manchester.ac.uk/our-research/examples-of-current-projects/fundamental-science/use-of-graphene-as-bio-membrane/ The traditional membranes used in dialysis are thick ...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more