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Titanium Boride Sputtering Targets and Applications

Titanium boride, which has the chemical formula of TiB 2 , is a well-known ceramic compound with hexagonal structure. The high hardness and Young's modulus of  Titanium Boride (TiB2) Sputtering Targets (Size:1'' ,Thickness:0.250'' , Purity: 99.5%)  as well as its chemical resistance are attributed to crystal structure and atomic bonding of the compound. Due to these properties, titanium boride films have been considered as protective coatings for several applications, including wear and corrosion protection of magnetic recording media and cutting tools.  Titanium boride  thin films were obtained by various techniques, such as reactive sputtering, plasma enhanced CVD, ion beam sputtering, pulsed laser deposition and rf- and dc-magnetron  sputtering . Among these techniques, dc-magnetron sputtering appears to be the most appropriate method for protective coatings applications due to the low deposition temperature, the possibility of using substrates with compli...