Nanografi Nanotechnology

General Information about Molybdenum                                          Molybdenum  is a chemical element with symbol Mo and atomic number 42. Molybdenum does not occur naturally as a free metal on Earth; it is found only in various oxidation states in minerals. Industrially,  molybdenum  compounds (about 14% of world production of the element) are used in high-pressure and high-temperature applications as pigments and catalysts. Molybdenum Nanoparticles/Nanopowder and Their Applications Molybdenum nanoparticles/nanopowder give very good result in situations where a lubricant needs to withstand high temperatures.  Molybdenum nanoparticles/nanopowder  are used in steel as anti-corrosive additives, vacuum valves, sintering additives, hard alloys and cutting tools. In the manufacture of high pressure vacuum tubes, heat tubes, X-Ray tubes  Mol...

Molybdenum trioxide is chemical compound with the formula MoO 3 . This compound is produced on the largest scale of any molybdenum compound.  Molybdenum Oxide (MoO3) Sputtering Targets (Size:2'' ,Thickness:0.125'' , Purity: 99.9% )  occurs as the rare mineral molybdite. The chief application of molybdenum oxide is as an oxidation catalyst and as a raw material for the production of molybdenum metal. Molybdenum is a transition metal and transition metal oxide films show wide variety of physical properties which make them as prime candidates for the exploration of structural properties in solids provides wide opportunities for technological applications. Among these transition metal oxides, molybdenum oxide shows interesting structural, electrical and optical properties.  Molybdenum Oxide Sputtering Targets  find applications as a cathode material in high density solid state micro batteries. Molybdenum oxide is considered as a chromogenic material since it shows ele...

Molybdenum disulfide is an inorganic compound composed of molybdenum and sulfur. Its chemical formula is MoS 2 . The compound is classified as a transition metal dichalcogenide. It is a silvery black solid that occurs as the mineral molybdenite, the principal one for molybdenum. MoS 2  is relatively unreactive. It is unaffected by dilute acids and oxygen. In appearance and feel,  Molybdenum Disulfide (MoS2) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.9%)  is similar to graphite. It is widely used as a dry lubricant because of its low friction and robustness. Molybdenum disulfide is made up of a single layer of a hexagonal crystal system or multiple layers connected by weak Van der Waals forces. Single-layered molybdenum disulfide consists of three atomic shells: a molybdenum (Mo) atomic shell in the middle and sulfur (S) atomic shells on both the top and bottom. There are very strong covalent bonds between the Mo atoms and S atoms that form the 2D ...

Molybdenum Disilicide (MoSi2) Sputtering Targets (Size:2'' ,Thickness:0.250'' , Purity: 99.95%)  which has the chemical formula of MoSi 2  is a refractory ceramic with primary use in heating elements. It has moderate density and is electrically conductive. At high temperatures it forms a passivation layer of silicon dioxide, protecting it from further oxidation. It is insoluble in most acids but soluble in nitric acid and hydrofluoric acid. Molybdenum Disilicide (MoSi2) Sputtering Targets  is a promising candidate material for high temperature structural applications. It is a high melting point (2030 °C) material with excellent oxidation resistance. However, low toughness at low temperatures and high creep rates at elevated temperatures have hindered its commercialization in structural applications. Molybdenum disilicide-based heating elements have been used extensively in high-temperature furnaces. The low electrical resistance of silicides in combination with hig...

Molybdenum is a chemical element with symbol Mo and atomic number 42.  Molybdenum  minerals have been known throughout history, but the element was discovered in 1778 by Carl Wilhelm Scheele. The metal was first isolated in 1781 by Peter Jacob Hjelm. As all we know the sputtering technique is a film-forming technique with which a plasma is utilized to generate ions striking a sputtering target so as to result in atoms of the sputtering target depositing on a substrate as a film. The sputtering technique is particularly used to produce a metallic layer in various manufacturing processes used in the semiconductor and the photoelectric industries. The properties of films formed during sputtering is related to the properties of the sputtering target itself, such as the size of the respective crystal grain and the formation of secondary phase with distribution characteristics. Of course you may obtain thin films by using  Molybdenum (Mo) Sputtering Targets (Size:6'' ,Thic...