Skip to main content

Molybdenum Oxide Sputtering Targets and Applications

Molybdenum trioxide is chemical compound with the formula MoO3. This compound is produced on the largest scale of any molybdenum compound. Molybdenum Oxide (MoO3) Sputtering Targets (Size:2'' ,Thickness:0.125'' , Purity: 99.9% ) occurs as the rare mineral molybdite. The chief application of molybdenum oxide is as an oxidation catalyst and as a raw material for the production of molybdenum metal.
Molybdenum is a transition metal and transition metal oxide films show wide variety of physical properties which make them as prime candidates for the exploration of structural properties in solids provides wide opportunities for technological applications. Among these transition metal oxides, molybdenum oxide shows interesting structural, electrical and optical properties. Molybdenum Oxide Sputtering Targets find applications as a cathode material in high density solid state micro batteries. Molybdenum oxide is considered as a chromogenic material since it shows electro-, photo- and gasochromic effects, and by virtue of these properties it is of scientific interest for the development of electrochromic display devices, optical switching and smart windows. Nanocrystalline molybdenum oxide films find applications in gas sensors and lubricants. In all these technological applications, the optimization of deposition conditions was very much essential to generate single phase molybdenum oxide films with required structural, electrical and optical properties. Different thin film physical deposition techniques such as thermal evaporation, electron beam evaporation, pulsed laser deposition and sputtering, and chemical deposition methods namely chemical vapour deposition, electrodeposition, spray pyrolysis and sol-gel process were used for preparation of molybdenum oxide films. Among the physical deposition methods, dc magnetron sputtering received considerable attention because of the preparation of uniform films on large area substrates by sputtering of metallic molybdenum target in the presence of oxygen and argon gas mixtures. 
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Improving Dialysis Process with Graphene

Researchers from Mechanical and Electrical Engineering Departments of MIT recently showed that graphene is a powerful material candidate for use in the dialysis systems (such as hemodialysis machines in medical institutes for filtering human blood). In order to prepare graphene as a dialysis material, researchers used a procedure opposite to the general treatments that nanotechnology people use. Dialysis is a process of filtering different solutions such as human blood by a membrane in order to remove waste molecules, drugs, chemical residues from the solution. In some cases, the process can be used for purification of chemicals or isolation of different molecules for medical diagnosis. It is an essential process for scientists especially in the medical operations. Image Retrieved From: http://www.graphene-nownano.manchester.ac.uk/our-research/examples-of-current-projects/fundamental-science/use-of-graphene-as-bio-membrane/ The traditional membranes used in dialysis are thick ...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more