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Molybdenum Oxide Sputtering Targets and Applications

Molybdenum trioxide is chemical compound with the formula MoO3. This compound is produced on the largest scale of any molybdenum compound. Molybdenum Oxide (MoO3) Sputtering Targets (Size:2'' ,Thickness:0.125'' , Purity: 99.9% ) occurs as the rare mineral molybdite. The chief application of molybdenum oxide is as an oxidation catalyst and as a raw material for the production of molybdenum metal.
Molybdenum is a transition metal and transition metal oxide films show wide variety of physical properties which make them as prime candidates for the exploration of structural properties in solids provides wide opportunities for technological applications. Among these transition metal oxides, molybdenum oxide shows interesting structural, electrical and optical properties. Molybdenum Oxide Sputtering Targets find applications as a cathode material in high density solid state micro batteries. Molybdenum oxide is considered as a chromogenic material since it shows electro-, photo- and gasochromic effects, and by virtue of these properties it is of scientific interest for the development of electrochromic display devices, optical switching and smart windows. Nanocrystalline molybdenum oxide films find applications in gas sensors and lubricants. In all these technological applications, the optimization of deposition conditions was very much essential to generate single phase molybdenum oxide films with required structural, electrical and optical properties. Different thin film physical deposition techniques such as thermal evaporation, electron beam evaporation, pulsed laser deposition and sputtering, and chemical deposition methods namely chemical vapour deposition, electrodeposition, spray pyrolysis and sol-gel process were used for preparation of molybdenum oxide films. Among the physical deposition methods, dc magnetron sputtering received considerable attention because of the preparation of uniform films on large area substrates by sputtering of metallic molybdenum target in the presence of oxygen and argon gas mixtures. 
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