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Lead Zirconium Titanate Sputtering Targets and Applications

Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Targets, Size:3'' ,Thickness:0.125'' , Purity: 99.9% is an inorganic compound with the chemical formula Pb[ZrxTi1-x]O3 (0≤x≤1). Lead zirconium titanate is also called PZT, it is a ceramic perovskite material that shows a marked piezoelectric effect, meaning that the compound changes shape when an electric field is applied. Lead zirconium titanate is used in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.
Lead zirconium titanate exhibits greater sensitivity and have a higher operating temperature. Due to its physical strength, chemical inertness, tailorability, and relatively inexpensive manufacture costs, it is one of the most commonly used piezo ceramics used in the industry.
Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Target based materials are components of ultrasound transducers and ceramic capacitors, STM/AFM actuators (tubes).
Lead zirconium titanate is known has the highest dielectric constant among advanced ceramic material. This is due to its perovskite structure that exists in high orientation of lead zirconium titanate resulted to dielectric constant which is looking forward to improving the storage capability of capacitor. Instead of being a ferroelectric material provided by its perovskite structure, Lead Zirconium Titanate, PZT (O5PbTiZr) Sputtering Target also has large band gap (3.2-3.7 eV) which make it suitable as semiconductor material as well. This indeed put lead zirconium titanate under potential material that could perform broader application especially for organic capacitor.
The preparation of lead zirconium titanate thin film were soon discovered by many techniques such as sol-gel process, pulse laser deposition, radio frequency (RF) magnetron sputter, and metal organic chemical vapor deposition (MOCVD) would also may affect the performance of electrical and structural properties thin films. In addition, rf magnetron sputter is considered as reliable method compared to other because it produces uniformity and smooth surface of thin film.
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