Skip to main content

Molybdenum Disilicide Sputtering Targets and Applications

Molybdenum Disilicide (MoSi2) Sputtering Targets (Size:2'' ,Thickness:0.250'' , Purity: 99.95%) which has the chemical formula of MoSi2 is a refractory ceramic with primary use in heating elements. It has moderate density and is electrically conductive. At high temperatures it forms a passivation layer of silicon dioxide, protecting it from further oxidation. It is insoluble in most acids but soluble in nitric acid and hydrofluoric acid.

Molybdenum Disilicide (MoSi2) Sputtering Targets is a promising candidate material for high temperature structural applications. It is a high melting point (2030 °C) material with excellent oxidation resistance. However, low toughness at low temperatures and high creep rates at elevated temperatures have hindered its commercialization in structural applications. Molybdenum disilicide-based heating elements have been used extensively in high-temperature furnaces. The low electrical resistance of silicides in combination with high thermal stability, electronmigration resistance, and excellent diffusion-barrier characteristics is important for microelectronic applications. Projected applications of MoSi2-based materials include turbine airfoils, combustion chamber components in oxidizing environments, missile nozzles, molten metal lances, industrial gas burners, diesel engine glow plugs, and materials for glass processing.
Molybdenum Disilicide (MoSi2) Sputtering Targets has emerged as one of the leading intermetallics for use at elevated temperatures. With the objective of developing an oxidation resistant coating system for high temperature applications (up to 1600°C), molybdenum disilicide is one of the compounds which has been studied on.
Molybdenum disilicide also can be used as a heating element in laboratory and industry. Also molybdenum disilicide sputtering targets can be used for protective coating on tantalum and niobium alloys.
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Bismuth Oxide Sputtering Targets and Applications

Bismuth oxide with the chemical formula of Bi 2 O 3  is one the most important bismuth compounds. Bismuth oxide has been investigated extensively due to its optical and electrical properties such as large energy gap (from 2 to 4 eV), refractive index and high oxygen ion conductivity at high and medium temperatures. These properties make bismuth oxide one of the most perspective candidates for application in optoelectronics, solar cells and solid oxide fuel cells (SOFCs). Bismuth oxide has a few main polymorphic forms that are known as α, β, γ, δ. All polymorphs have different crystal structure and various optical, electrical and mechanical properties. Only two of them, the low temperature monoclinic α-phase and high temperature face-centered cubic δ-phase are stable. The other phases are metastable. Magnetron sputtering is a widespread method because of high deposition rate, dense and highly adhesive films, and possibility of using commercially available large area depositio...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more