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Magnesium Oxide Sputtering Targets and Applications

Magnesium oxide which has the chemical formula of MgO, is a white hygroscopic solid mineral that occurs naturally. Magnesium and its alloys like magnesium oxide can be used in various areas. Now let's see some examples of the applications where Magnesium Oxide (MgO) Sputtering Targets (Size:1'' ,Thickness:0.125'' , Purity: 99.95%) can be used.
Coatings or materials containing magnesium has gained considerable research attention the last years because they find application in catalysis and surface protection, as well as in high k dielectrics, ionic conductors, high Tc superconductors, and thin film batteries. Magnesium Oxide (MgO) Sputtering Targets thin films which can be obtained by different sputtering techniques play a particularly important role in the high quality and long lifetime of plasma display panels. When we look at biomedical applications Mg alloys have been used as degradable implants in the clinic since 1878 for their good biocompatibility.
As we have mentioned before magnesium oxide is one of the alloys of magnesium. Magnesium oxide thin films which can be obtained by different sputtering techniques are very important scientific and commercial material. Magnesium oxide thin films widely used as a protective layer for AC-plasma display panels because of their high durability and gas sensing systems, good protection characteristics against ion bombardment, high secondary electron emission coefficient and high transparency. Magnesium oxide is a best candidate to be used as dielectric layer due to its excellent properties such as has high dielectric constant, large band gap and has higher breakdown field compared to commonly used dielectric layer which is silicon dioxide. Due to its excellent dielectric properties, Magnesium Oxide (MgO) Sputtering Targets has been proposed to be used for capacitor applications because magnesium oxide can improve the storage capability of a capacitor. Other characteristics of magnesium oxide that comparable to silicon dioxide are due to its chemical inertness, electrical insulation, optical transparency, high temperature stability, high thermal conductivity and secondary-electron emission. Due to its excellent properties, magnesium oxide has been proposed to replace current dielectric material silicon dioxide.
Magnesium Oxide with rocksalt-structure has been extensively investigated due to its exceptional properties, such as chemical inertness, high electrical resistivity, optical transparency, and low thermal conductivity. The most used techniques to obtain these films are organ metallic using thermal evaporation, flame spray paralysis, combustion aerosol synthesis, chemical vapor deposition, hydrothermal, and surfactant methods. 
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