Molybdenum Nanoparticles/Nanopowder and Applications

General Information about Molybdenum

Molybdenum is a chemical element with symbol Mo and atomic number 42. Molybdenum does not occur naturally as a free metal on Earth; it is found only in various oxidation states in minerals. Industrially, molybdenum compounds (about 14% of world production of the element) are used in high-pressure and high-temperature applications as pigments and catalysts.

Molybdenum Nanoparticles/Nanopowder and Their Applications

Molybdenum nanoparticles/nanopowder give very good result in situations where a lubricant needs to withstand high temperatures. Molybdenum nanoparticles/nanopowder are used in steel as anti-corrosive additives, vacuum valves, sintering additives, hard alloys and cutting tools. In the manufacture of high pressure vacuum tubes, heat tubes, X-Ray tubes Molybdenum Nanoparticles/Nanopowder can be useful. Molybdenum nanoparticles/nanopowder are well-known as a coating of choice in high-friction, heavy load environments, due to the extreme lubrication they offer. Molybdenum nanoparticles/nanopowder offer a simple, effective way to apply such coatings with extreme precision.

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Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal. Molybdenum Trioxide is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications Like many nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/ nanopowder are useful for...

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...

New Way of Deaf-Mute Communication with 3D Graphene

Image retrieved from: http://blogs.rsc.org/cc/2016/09/01/3d-graphene-adds-dimension-to-deaf%E2%80%93mute-communication/ Chinese scientists have developed wearable electronic device with conductive 3D graphene structure to translate sign language into written text. This technology can be applied by injecting graphene ink from a syringe under printed electronic field. For medical field, such as adhesive patches which determine heart, brain signal and neural activity, wearable and bio-integrated medical devices are very important. Due to noticeable properties of cast graphene, for example a 2D honeycomb lattice, excellent mechanical and electrical behaviors, Graphene has an important material in warble technology. However, it is difficult to preserve advantages of Graphene material in a 3D material which has an information about forces from every angle. Yanlin Song and co-workers at the University of the Chinese Academy of Sciences, Beijing, and Shenyang Jianzhu University...

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