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Boron Carbide Sputtering Targets and Applications

Boron carbide with the chemical formula of B4C is an extremely hard boron–carbon ceramic. After diamond and cubic boron nitride, boron carbide has the highest hardness known. This hardness and strength make boron carbide a key element for using in tank armor, bulletproof vests, engine sabotage powders as well as numerous industrial applications.
Boron carbide gives excellent wear resistance and high strength to the materials when it is used as sputtering target. Boron carbide has a low density but a high elastic modulus and high compressive strength, which leads to its use as a ballistic material. Boron carbide has good resistance to acids but not to alkali hydroxide melts.
Boron carbide sputtering targets give good results in semiconductor applications. In view of the applicability of boron carbide based semiconductor devices in harsh environments, the microstructure and composition of boron carbide phases have been the subject of much investigation, where bulk single crystals, polycrystalline samples and thin films have been studied. You may find a paper written about boron carbide sputtering from the link given below:
Since it is a very hard and strong material, you may obtain superhard films with the thickness of 2 micron by using boron carbide sputtering targets. In some applications very thick films are not desired and to obtain thin films with the very good mechanical properties, boron carbide sputtering targets are one of the compounds that you can use and achieve your goal. You can read a research paper about the film that obtained by boron carbide sputtering targets below:
You can order boron carbide sputtering targets for your research needs from the links given on the table below:
TypeSizeThicknessPurityLink
Boron Carbide3'0.250''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-3-thickness-0-250-purity-99-5/
Boron Carbide4'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-4-thickness-0-125-purity-99-5/
Boron Carbide4'0.250''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-4-thickness-0-250-purity-99-5/
Boron Carbide6'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-6-thickness-0-125-purity-99-5/
Boron Carbide6'0.250''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-6-thickness-0-250-purity-99-5/
Boron Carbide8'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-8-thickness-0-125-purity-99-5/
Boron Carbide8'0.250''99.5%https://nanografi.com/sputtering-targets/boron-carbide-b4c-sputtering-targets-size-8-thickness-0-250-purity-99-5/
Boron Carbide Indium1'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-indium-b4c-sputtering-targets-size-1-thickness-0-125-purity-99-5/
Boron Carbide Indium2'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-indium-b4c-sputtering-targets-size-2-thickness-0-125-purity-99-5/
Boron Carbide Indium3'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-indium-b4c-sputtering-targets-size-3-thickness-0-125-purity-99-5/
Boron Carbide Indium4'0.125''99.5%https://nanografi.com/sputtering-targets/boron-carbide-indium-b4c-sputtering-targets-size-4-thickness-0-125-purity-99-5/

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