Skip to main content

Aluminum Silicon Sputtering Targets

Aluminum Silicon is an alloy of aluminum with silicon. This alloy can be used in sputter deposition which is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate".
By adding silicon to aluminum, aluminum silicon sputtering targets can be obtained with the properties of high castability, corrosion resistance and low density.
Sputtering made by aluminum silicon alloys are resistant to heat, high temperature oxidation and corrosion and offers a high level of reflectivity, making it suitable for applications in a corrosive atmosphere at high temperatures.
Aluminum silicon sputtering targets give metals protection from corrosion/erosion and dusting. Aluminum silicon sputtering targets can be widely used, allowing a reduction of overall operating costs when used in place of more expensive materials. Aluminum silicon sputtering target’s high level of reflectivity makes it an ideal coating for thermal insulation applications.
Aluminum silicone sputtering target are used in automobile sector. The usage areas of aluminum silicon sputtering targets in automobile are insulating heat shields, engine heat shields, exhaust systems, fuel tanks, biodiesel filters, machinery casings and underbody parts.
There are some researches completed about aluminum silicon sputtering targets. For example, in one research aluminum silicon sputter targets are used for magnetron sputtering. You may read the details of the study from the link given below:
We offer you aluminum silicon sputtering targets in many different forms. You may see our product range below.
TypeSizeThicknessPurityLink
Aluminum Silicon1'0.125''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-1-thickness-0-125-purity-99-999/
Aluminum Silicon1'0.250''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-1-thickness-0-250-purity-99-999/
Aluminum Silicon2'0.125''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-2-thickness-0-125-purity-99-999/
Aluminum Silicon2'0.250''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-2-thickness-0-250-purity-99-999/
Aluminum Silicon3'0.125''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-3-thickness-0-125-purity-99-999/
Aluminum Silicon3'0.250''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-3-thickness-0-250-purity-99-999/
Aluminum Silicon4'0.125''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-4-thickness-0-125-purity-99-999/
Aluminum Silicon4'0.250''99.999%https://nanografi.com/sputtering-targets/aluminum-silicon-alsi-sputtering-targets-size-4-thickness-0-250-purity-99-999/

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Titanium Carbide Powders and Applications

Titanium carbide which has the chemical formula of TiC attracted great interest for many structural applications due to its extremely high melting temperature, high hardness, high chemical resistance and good electrical conductivity. Therefore titanium carbide can be used in cutting tools, grinding wheels, wear-resistant coatings, high temperature heat exchangers, magnetic recording heads, turbine engine seals, and bullet-proof vests, etc. In addition, a promising field of application comprises plasma and flame spraying processes in air, where titanium carbide-based powders show high-phase stability. TiC(Titanium Carbide Powder) (325 mesh, 99,9+%)  can also be used in biomedical implant devices. Materials used for biomedical implant devices must satisfy a variety of property demands, which are often mutually exclusive. Further, different parts of a device demand different material properties. These factors often make it difficult to manufacture a medical device using a...
Post a Comment
Read more

Bismuth Oxide Sputtering Targets and Applications

Bismuth oxide with the chemical formula of Bi 2 O 3  is one the most important bismuth compounds. Bismuth oxide has been investigated extensively due to its optical and electrical properties such as large energy gap (from 2 to 4 eV), refractive index and high oxygen ion conductivity at high and medium temperatures. These properties make bismuth oxide one of the most perspective candidates for application in optoelectronics, solar cells and solid oxide fuel cells (SOFCs). Bismuth oxide has a few main polymorphic forms that are known as α, β, γ, δ. All polymorphs have different crystal structure and various optical, electrical and mechanical properties. Only two of them, the low temperature monoclinic α-phase and high temperature face-centered cubic δ-phase are stable. The other phases are metastable. Magnetron sputtering is a widespread method because of high deposition rate, dense and highly adhesive films, and possibility of using commercially available large area depositio...
Post a Comment
Read more