Aluminum oxide is a chemical compound of aluminium and oxygen with the chemical formula Al2O3. Al2O3 is significant in its use to produce aluminium metal, as an abrasive owing to its hardness, and as a refractory material owing to its high melting point.
Aluminum oxide thin films which can be obtained by aluminum oxide sputtering targets are widely used in many mechanical, optical and microelectronic applications because of their excellent properties, mechanical strength and hardness, transparency, high abrasion and corrosion resistance, as well as insulating and optical properties. All these properties of aluminum oxide film depend on different parameters of sputtering system such as sputtering rate, distance between the target and substrate, pressures of reactive gases etc.
Aluminum oxide thin films which find various important applications in technology like in optoelectronics, tribology, sensorics, nanolithography have been deposited by various techniques as magnetron sputtering, atomic layer deposition, electron beam evaporation, spray pyrolysis, oxidation of aluminum film. You may find a paper in the link given below which shows an application made by radio frequency sputtering.
As a summary Al2O3 has unique properties in terms of chemical inertness, mechanical strength and hardness, high abrasion and corrosion resistance, as well as its high electrical breakdown field and high dielectric constant and thin films obtained by aluminum oxide sputtering targets have received growing attention of researchers worldwide. To use aluminum oxide sputtering targets in your researches which is related to various mechanical and microelectrical applications such as protective coatings, diffusion barriers, electronic seals, dielectric layers, optical layer, etc, you may give an order of this product from the link given on the table below:
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