Chromium oxide is the inorganic compound of the formula Cr2O3. Chromium oxide sputtering targets are used in many applications. Not let’s look at some examples where chromium oxide sputtering targets are used.
Cr2O3 thin films exhibit high hardness values and low friction coefficients. These properties make chromium oxide a serious candidate to replace transition metal nitrides or Al2O3 in special applications. You can reach out detailed information from the link given below.
Thin films of chromium oxide are an important material for a wide variety of optical and electrical applications. Many integrated circuit, flat panel display and optical devices require thin films of chromium oxide. You may find a patent related to this topic in the link given below.
Another study about chromium oxide sputtering targets is related with magnetic recording applications. Hard coatings are commonly used in magnetic heads and media for protection against corrosion and wear. Chromium oxide coatings have been developed for protection of the tape bearing surface of digital compact cassette (DCC) heads. For detailed information you may go to the address given below.
If you need chromium oxide sputtering targets for your research please kindly go to the links given on the table below in order to give an order.
TypeSizeThicknessPurityLinkChromium Oxide1'0.125'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-1-thickness-0-125-purity-99-8-99-9/Chromium Oxide1'0.250'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-1-thickness-0-250-purity-99-8-99-9/Chromium Oxide2'0.125'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-2-thickness-0-125-purity-99-8-99-9/Chromium Oxide2'0.250'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-2-thickness-0-250-purity-99-8-99-9/Chromium Oxide3'0.125'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-3-thickness-0-125-purity-99-8-99-9/Chromium Oxide3'0.250'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-3-thickness-0-250-purity-99-8-99-9/Chromium Oxide4'0.125'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-4-thickness-0-125-purity-99-8-99-9/Chromium Oxide4'0.250'’99.8% — 99.9%https://nanografi.com/sputtering-targets/chromium-oxide-cr2o3-sputtering-targets-size-4-thickness-0-250-purity-99-8-99-9/Chromium Oxide (Indium)5'0.125'’99.8%https://nanografi.com/sputtering-targets/chromium-oxide-indium-cr2o3-sputtering-targets-size-2-thickness-0-125-purity-99-8/Chromium Oxide (Indium)5'0.250'’99.8%https://nanografi.com/sputtering-targets/chromium-oxide-indium-cr2o3-sputtering-targets-size-3-thickness-0-125-purity-99-8/Chromium Oxide (Indium)6'0.125'’99.8%https://nanografi.com/sputtering-targets/chromium-oxide-indium-cr2o3-sputtering-targets-size-4-thickness-0-125-purity-99-8/
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