Skip to main content

Tungsten Sputtering Targets and Applications

Tungsten is a chemical element with symbol W and atomic number 74. Tungsten is a rare metal found naturally on Earth almost exclusively combined with other elements in chemical compounds rather than alone.
Tungsten sputtering targets can be used in various applications like light bulb filaments, X-ray tubes, electrodes in gas tungsten arc welding, superalloys, and radiation shielding. Tungsten has high density and hardness and this make it useful for military applications in penetrating projectiles. Tungsten compounds are also often used as industrial catalysts.
Also there are different applications that you may use tungsten sputtering targets to obtain uniform films. Now let's have a look at a research done by using tungsten sputtering targets.
As all we may know there is an increasing interest in solid-state thermal-to-electricity energy conversion concepts, such as thermophotovoltaic (TPV), solar TPV, and solar-thermal energy conversion systems. This has led to new investigation and fabrication of refractory metal two-dimensional (2D) photonic crystals (PhCs). These nanostructured surfaces show good optical and mechanical properties at high temperatures and act as selective emitters to increase the efficiency of the thermophotovoltaic cell.
An integrated PhC thermophotovoltaic system would be advantageous with the properties of simplifying the system integration and increasing the fabrication simplicity. A tungsten coating could be used as a functional layer on different substrates and matched to the system’s needs, decoupling the requirements of the functional layer and the substrate.
For detailed information about the usage of tungsten as sputtering targets, you may click the link below to read the rest of this paper:
If you need tungsten sputtering targets for your research needs, you may click the links below:

Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Hydroxyapatite Nanopowders and Their Applications

Hydroxyapatite, is a naturally occurring mineral form of calcium apatite with the formula Ca 5 (PO 4 ) 3 (OH). Pure hydroxyapatite powder is white. Naturally occurring apatites can, however, also have brown, yellow, or green colorations, comparable to the discolorations of dental fluorosis. Hydroxyapatite Nanopowder/Nanoparticles (50 nm, 99.95+%)  has been widely used as a biocompatible ceramic in many areas of medicine, but mainly for contact with bone tissue, due to its resemblance to mineral bone. In mammals, the skeleton presents a carbonated and partially substituted apatite, based on nanocrystal aggregates, and associated with collagen, building up 3-D structures present in various bone tissue conformations like trabecular or cancellous bone. There has been growing interest in developing bioactive synthetic ceramics that could closely mimic natural apatite characteristics. As mentioned before,  Hydroxyapatite Nanopowder  is the main inorganic constituent of bon...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more