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Carbon Sputtering Targets and Applications

Carbon is a chemical element with symbol C and atomic number 6. Carbon is the 15th most abundant element in the Earth's crust, and the fourth most abundant element in the universe by mass after hydrogen, helium, and oxygen. Carbon's ability to give reactions with the most the elements makes it a vital for life.
As we mentioned above carbon is an element that gives reactions easily and this property of carbon make it useful in too many applications. When we focus on nanaparticles of carbon, we see that we can obtain thin films with these particles and use them for various aims. Now let's look at the properties of carbon sputtering targets and how we can obtain them.
Carbon sputtering targets, which have unique characteristics from the wide tunability of their chemical bonds. There are different ways to obtain carbon films and magnetron sputtering is one of these ways. There are three possible mechanisms for the deposition of carbon films with magnetron sputtering. First, the use of argon positive ions may induce sputtering of carbon atoms onto film surfaces like knock-on collision. Second, continuous bombardment of argon ions may enhance the densification of sputtered carbon atoms on the films. Finally, the conversion of sp2to sp3bonds, driven by high local stress, would be generated by the intense bombardment of argon ions.
Porous carbon films that can be obtained by magnetron sputtering are important for various applications such as in gas separation, ultra-filtration, membrane reactors, fuel cells, and bio-sensors. To see how carbon films can be obtained by magnetron sputtering you may check the paper below:
For your carbon sputtering targets needs, you may click the links given below:
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