Lanthanum Aluminate Sputtering Targets and Applications

Lanthanum aluminate is an inorganic compound with the formula LaAlO3. Lanthanum aluminate is an optically transparent ceramic oxide and it has a distorted perovskite structure. Lanthanum aluminate sputtering targets have high relative electric constant.

With the properties mentioned above and the perovskite structure of lanthanum aluminate make it useful in many different applications. So lanthanum aluminate sputtering targets have become one of the materials for sputtering techniques because of its relatively low dielectric constant and chemical stability. Also lanthanum aluminate is a suitable dielectric material for many areas.

When we look at the applications where lanthanum aluminate sputtering targets are used we can see that in the fabrication of high temperature superconductor lanthanum aluminate can be used. By sputtering targets of lanthanum aluminate ferroelectric thin films also can be obtained. To increase the thermal stability thin films obtained by sputtering targets of lanthanum aluminate can be used.

Lanthanum aluminate is one of the chemicals that is worked on too much. In one of the studies lanthanum aluminate was used fabricate thin film transistors.

If you need lanthanum aluminate for your researches you may contact with us by clicking the links given below:

https://nanografi.com/sputtering-targets/lanthanum-aluminate-indium-laalo3-sputtering-targets-size-1-thickness-0-125-purity-99-9/https://nanografi.com/sputtering-targets/lanthanum-aluminate-indium-laalo3-sputtering-targets-size-2-thickness-0-125-purity-99-9/

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