Skip to main content

Lithium Niobate Sputtering Targets and Applications

Lithium Niobate (LiNbO3) Sputtering Targets (Size:1'' ,Thickness:0.250'' , Purity: 99.9%) which has the chemical formula of LiNbO3 is a compound of niobium, lithium, and oxygen. Its single crystals are an important material for optical waveguides, mobile phones, piezoelectric sensors, optical modulators and various other linear and non-linear optical applications. It is a human-made dielectric material that does not exist in nature.
Lithium Niobate (LiNbO3) Sputtering Targets crystals were grown for the first time by the Chokhralsky method in 1965, and their structure was investigated by Abrahams in the series of works. Lithium niobate belongs to a R3c space group, where the oxygens are arranged in nearly hexagonal close-packed planar sheets. 
One of the potential applications of Lithium Niobate (LiNbO3) Sputtering Targets as an elemental basis of electro-optical devices is high speed (>20 GHz) modulators. Thin lithium niobate films contrary to bulk material, provide higher intensity per unit power in waveguides, and hence a stronger nonlinear optical effect and shorter interaction length. The ability to fabricate the films on various substrates extends the spectrum of their possible applications.
Here the important thing is to choose an appropriate synthesis method of thin lithium niobate films to lean on its possibility to preserve the elemental composition and structure of a bulk material, and also on the reproductive ability of this technique. Various fabrication methods have been proposed to satisfy these conditions, namely sol–gel, pulsed-laser deposition (PLD), discrete thermal evaporation in vacuum, radio frequency magnetron sputtering (RFMS), chemical vapor deposition (CVD), liquid phase epitaxy (LPE), ion-beam sputtering (IBS).
For example radio frequency magnetron sputtering is one of the options to obtain lithium niobate thin films. Radio frequency magnetron sputtering has these advantages:
  • lower reactive gas pressure, providing the appropriate free path length for ion motion in the space charge area;
  • ability to regulate the ion energy in a wide range through magnetic field at the constant source power;
  • high rate of sputtering;
  • independence of the sputtering coefficients of a material on its melting point;
  • reproducibility of elemental composition of a sputtered material.
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Rundown about Silicon Oxide Wafer

The main insulating material used in micro-technology is Silicon Dioxide, which in chemical symbols is written as SiO2. In semiconductor technology, SiO2 thin film layers are mainly used as dielectric material film in transistors, capacitors (DRAM) or flash-memories. Silicon Oxide Wafers are produced using crystallization, solid state and other ultra-high purification processes such as sublimation. This process forms a cylindrical ingot, which is then sliced and polished to form wafers. Thermal oxide is a kind of "grown" oxide layer, compared to CVD deposited oxide layer, it has a higher uniformity, and higher dielectric strength, it is an excellent dielectric layer as an insulator . In most silicon- based devices, thermal oxide layer play an important role to pacify the silicon surface to act as doping barriers and as surface dielectrics. The simplest way to produce an insulating silicon oxide layers (SiO2) on silicon wafers is to oxidize silicon with oxygen, which ...
Post a Comment
Read more

New Way of Deaf-Mute Communication with 3D Graphene

Image retrieved from: http://blogs.rsc.org/cc/2016/09/01/3d-graphene-adds-dimension-to-deaf%E2%80%93mute-communication/ Chinese scientists have developed wearable electronic device with conductive 3D graphene structure to translate sign language into written text. This technology can be applied by injecting graphene ink from a syringe under printed electronic field. For medical field, such as adhesive patches which determine heart, brain signal and neural activity, wearable and bio-integrated medical devices are very important. Due to noticeable properties of cast graphene, for example a 2D honeycomb lattice, excellent mechanical and electrical behaviors, Graphene has an important material in warble technology. However, it is difficult to preserve advantages of Graphene material in a 3D material which has an information about forces from every angle. Yanlin Song  and co-workers at the University of the Chinese Academy of Sciences, Beijing, and Shenyang Jianzhu University...
Post a Comment
Read more