Skip to main content

Lithium Niobate Sputtering Targets and Applications

Lithium Niobate (LiNbO3) Sputtering Targets (Size:1'' ,Thickness:0.250'' , Purity: 99.9%) which has the chemical formula of LiNbO3 is a compound of niobium, lithium, and oxygen. Its single crystals are an important material for optical waveguides, mobile phones, piezoelectric sensors, optical modulators and various other linear and non-linear optical applications. It is a human-made dielectric material that does not exist in nature.
Lithium Niobate (LiNbO3) Sputtering Targets crystals were grown for the first time by the Chokhralsky method in 1965, and their structure was investigated by Abrahams in the series of works. Lithium niobate belongs to a R3c space group, where the oxygens are arranged in nearly hexagonal close-packed planar sheets. 
One of the potential applications of Lithium Niobate (LiNbO3) Sputtering Targets as an elemental basis of electro-optical devices is high speed (>20 GHz) modulators. Thin lithium niobate films contrary to bulk material, provide higher intensity per unit power in waveguides, and hence a stronger nonlinear optical effect and shorter interaction length. The ability to fabricate the films on various substrates extends the spectrum of their possible applications.
Here the important thing is to choose an appropriate synthesis method of thin lithium niobate films to lean on its possibility to preserve the elemental composition and structure of a bulk material, and also on the reproductive ability of this technique. Various fabrication methods have been proposed to satisfy these conditions, namely sol–gel, pulsed-laser deposition (PLD), discrete thermal evaporation in vacuum, radio frequency magnetron sputtering (RFMS), chemical vapor deposition (CVD), liquid phase epitaxy (LPE), ion-beam sputtering (IBS).
For example radio frequency magnetron sputtering is one of the options to obtain lithium niobate thin films. Radio frequency magnetron sputtering has these advantages:
  • lower reactive gas pressure, providing the appropriate free path length for ion motion in the space charge area;
  • ability to regulate the ion energy in a wide range through magnetic field at the constant source power;
  • high rate of sputtering;
  • independence of the sputtering coefficients of a material on its melting point;
  • reproducibility of elemental composition of a sputtered material.
Labels:

Comments

Post a Comment

Popular posts from this blog

Molybdenum Trioxide Nanoparticles/Nanopowder and Applications

General Information about Molybdenum Trioxide                                                     Molybdenum trioxide is chemical compound with the formula MoO3. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal.  Molybdenum Trioxide  is a very light blue powder. Molybdenum Trioxide Nanoparticles/Nanopowder and Their Applications                                                    Like many  nanoparticles/nanopowder , Molybdenum Trioxide nanoparticles/nanopowder are used as catalysts. These catalysis reactions include hydrogenation catalysis and cracking catalysis. Molybdenum Trioxide nanoparticles/  nanopowder are useful for...
Post a Comment
Read more

Titanium Carbide Powders and Applications

Titanium carbide which has the chemical formula of TiC attracted great interest for many structural applications due to its extremely high melting temperature, high hardness, high chemical resistance and good electrical conductivity. Therefore titanium carbide can be used in cutting tools, grinding wheels, wear-resistant coatings, high temperature heat exchangers, magnetic recording heads, turbine engine seals, and bullet-proof vests, etc. In addition, a promising field of application comprises plasma and flame spraying processes in air, where titanium carbide-based powders show high-phase stability. TiC(Titanium Carbide Powder) (325 mesh, 99,9+%)  can also be used in biomedical implant devices. Materials used for biomedical implant devices must satisfy a variety of property demands, which are often mutually exclusive. Further, different parts of a device demand different material properties. These factors often make it difficult to manufacture a medical device using a...
Post a Comment
Read more

Bismuth Oxide Sputtering Targets and Applications

Bismuth oxide with the chemical formula of Bi 2 O 3  is one the most important bismuth compounds. Bismuth oxide has been investigated extensively due to its optical and electrical properties such as large energy gap (from 2 to 4 eV), refractive index and high oxygen ion conductivity at high and medium temperatures. These properties make bismuth oxide one of the most perspective candidates for application in optoelectronics, solar cells and solid oxide fuel cells (SOFCs). Bismuth oxide has a few main polymorphic forms that are known as α, β, γ, δ. All polymorphs have different crystal structure and various optical, electrical and mechanical properties. Only two of them, the low temperature monoclinic α-phase and high temperature face-centered cubic δ-phase are stable. The other phases are metastable. Magnetron sputtering is a widespread method because of high deposition rate, dense and highly adhesive films, and possibility of using commercially available large area depositio...
Post a Comment
Read more